LAPCVD 300mm Tools 1 페이지

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LAPCVD 300mm tools

Business Areas

반도체 공정중 확산막 형성에 사용되는 장비로 절연 산화막 형성, N2 Anneal 공정 등 장시간 고온 열처리 장비

LAPCVD 300mm Tools

Equipment used to form an insulating oxide film by forming a diffusion film in a semiconductor process.
Long-time high-temperature heat treatment equipment such as LAPCVD

Brand New Refurbish Installation Modify Parts sale Repair Overhaul

LPCVD, AP ANNEAL LARGE BATCH

	TEOS, POLY, SIN, OXIDATION, ANNEAL, PIQ
	MAX 23 BUFFER
	MAX 175 BATCH WAFER
	HIGH SPEED CONTROL SYSTEM(EtherCAT)
	NEXT GENERATION GROUP CONTROL
	LOW, MID, HIGH TEMP HEATER
	BATCH ALD-SIN

MAIN BODY

SPUTTERING SYSTEM

	Cluster/In-line Sputtering System
	Al, Ti, Cu, Sus, Mo, ITO, SiO2, TiO2, SiN, CrOx, ZnO, AZO
	Thickness Uniformity : < ±5
	Uniformity of RTR : < ±3%
	Heat uniformity : <± 3%
	Power Supply : DC, Pulsed DC, RF
	EtherCAT Control
	Advanced Group Cotrol

예제 제품 5

IGS Block

	H2, N2 ANNEAL
	SiN, ALD-SiN, HCD-SiN
	POLY
	TEOS
	HTO
	OXIDE

예제 제품 4

AGC

	303I, INDY, INDY+, FORMULA
	CX3000, CX5000
	SPUTTERING SYSTEM
	LAPCVD 300mm SYSTEM

예제 제품 3

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